Comparison of the Performance-Degrading Near-Interface Traps in Commercial SiC MOSFETs
نویسندگان
چکیده
This paper presents a comparison of the density performance-degrading near-interface traps (NITs) in most commonly available 1200 V commercial N-channel SiC power metal–oxide–semiconductor field-effect transistors (MOSFETs). A recently developed integrated-charge technique was used to measure NITs with energy levels aligned conduction band, which degrade MOSFET’s performance by capturing and releasing electrons from channel biased strong-inversion condition. Trench MOSFETs one manufacturer have lower densities these planar gate structure, corresponding observed higher channel-carrier mobility trench MOSFETs. Different response-time distributions were also observed, different spatial location measured NITs.
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ژورنال
عنوان ژورنال: Materials Science Forum
سال: 2023
ISSN: ['1422-6375', '0250-9776', '0255-5476', '1662-9752', '1662-9760']
DOI: https://doi.org/10.4028/p-258768